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ELECTRON BEAM RESISTS WITH
ULTRA-HIGH ASPECT RATIOS

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SIGNIFICANTLY IMPROVED
3D BIO-IMAGING

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Innovative new electron beam nanotechnologies

Sci-Tron is a nanotechnology specialist working with novel nano materials. These include advanced electron beam resists for the production of integrated circuits and state-of-the-art resins for 3D bio-imaging.

The Sci-Tron team is essentially made up of R&D people who are now looking for collaborative partnerships to explore and develop their technologies and investors to help them realise their commercial potential.


New electron beam resists

Technology that significantly out-performs current industry-standard resists

  • Ultra-high resolution (sub 10 nm)

Sci-Tron’s positive and negative electron beam resists offer major advantages over current electron beam resists through a combination of ultra-high resolution (sub 10-nm) and an ultra-large aspect ratios (10:1 @ 30KV). These resists have etch selectively >20:1 with SF6 and C4F8 gases.

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New SEM bio-imaging resin technology

Fast-track SEM images now available with the same high resolution as those of TEM

  • Much higher resolution than standard SEM resins
  • Overcomes the serious problem inherent in current resins of electron beam damage leading to loss of images
  • Significantly improves the diagnostic ability of hospital pathology laboratories

Sci-Tron’s 3D bio-imaging resins achieve a first – 3D SEM images of the same high resolution as a hospital TEM would obtain but available in a fraction of the time. No other resins offer this pioneering combination of image quality and speed.

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